Hv converter with reduced emi

ABSTRACT

A high voltage (HV) converter implemented on a printed circuit board (PCB) includes a double diffused metal oxide semiconductor (DMOS) package comprising a lead frame and a main DMOS chip. The lead frame includes a gate section electrically connected to a gate electrode of the main DMOS chip, a source section electrically connected to a source electrode of the main DMOS chip and a drain section electrically connected to a drain electrode of the main DMOS chip. The PCB layout includes a large area source copper pad attached to and overlapping the source section of the DMOS package to facilitate cooling and a small area drain copper pad attached to and overlapping the drain section of the DMOS package to reduce electromagnetic interference (EMI) noise.

INCORPORATION BY REFERENCE

The disclosure made in the U.S. Pat. No. 5,402,329 to Wittenbreder Jr.and U.S. Patent Application Publication Number 2017/0264206 to Rana etal. are hereby incorporated by reference.

FIELD OF THE INVENTION

This invention relates generally to high voltage converters usingdouble-diffused metal-oxide semiconductor (DMOS) devices. Moreparticularly, the present invention relates to a high voltage converterwith improved electromagnetic interference (EMI) noise using an improvedDMOS package.

BACKGROUND OF THE INVENTION

FIG. 1 shows circuitry 400 of a single-switch flyback converter inexamples of the present disclosure. The single-switch flyback converterincludes a switch 420, a transformer 440 and a resistor 460. Thetransformer 440 has a primary winding 442 and a secondary winding 444. Afirst end of the switch 420 is connected to a first end of the primarywinding 442 of the transformer 440. A second end of the switch 420 isconnected to the first end of the resistor 460. A second end of theresistor 460 is connected to a ground.

FIG. 2 shows a printed circuit board (PCB) layout 500 for a conventionalsingle-switch flyback converter. The PCB layout 500 is configured toreceive a conventional DMOS device. The conventional DMOS device has asmall area source lead attached to a small copper pad 510 on the PCB anda large area drain lead 540 attached to a large copper pad area 520 onthe PCB. The DMOS chip is above the large copper pad area 520overlapping the large area drain lead 540. The drain electrode of theDMOS chip is connected to the transformer TX1 through the large areadrain lead 540 and large copper pad area 520. The source electrode ofthe DMOS chip is connected to ground through resistor R2. Theperformance of the PCB layout 500 is not optimized due to necessarytradeoff between thermal dissipation and EMI noise reduction. The DMOSdevice Q1 is hot and needs a large copper pad area 520 (for example,larger than 10 mm in length and 5 mm in width) for cooling. However, thelarge area drain lead 540 has high voltage and has high dv/dt value. Itcouples electromagnetic interference (EMI) noise to the system. This maynot be a problem for low voltage application. However for high voltageapplications such as 500V or higher, the EMI noise is high due to thefast changing and high drain voltage. It requires a small copper padarea 520 to reduce the EMI noise. This is in contrary to larger copperpad area 520 for cooling purpose. The tradeoff of a large copper padarea 520 is large EMI noise. Furthermore, for high voltage applications,the high voltage drain lead with large area will demand large safetyspace therefore increasing the device area, making it challenge tominimize the device size while keeping safety space for high voltage.

It is advantageous to implement an improved DMOS package in high voltageflyback application to reduce the EMI. It is advantageous to improve theDMOS package by reducing the drain lead area to reduce the EMI of theflyback convertor, and further to add an insulation material between theDMOS chip and a lead frame, to introduce V-shaped grooves in the leadframe, and to use an island-type lead frame (with raised portions)because it results in better thermal performance by having a largecopper pad area yet still with less electromagnetic noise.

SUMMARY OF THE INVENTION

The present invention discloses high voltage converters implementingwith double-diffused metal-oxide semiconductor (DMOS) packages includinga lead frame, a main DMOS chip, a first plurality of metal bumps, asecond plurality of metal bumps, a connector and a moldingencapsulation. The lead frame includes a gate section, a source sectionand a drain section. The main DMOS chip has a gate electrode and asource electrode disposed on a bottom surface of the main DMOS chip anda drain electrode disposed on a top surface of the main DMOS chip. A PCBlayout for a flyback converter includes a large copper pad area on thePCB overlapping with a large source lead area to facilitate cooling anda small copper pad area on the PCB overlapping with a small drain leadarea to minimize electromagnetic interference (EMI) noise.

A DMOS package may include a main switch and a clamping switch. In oneexample, the main switch includes a main DMOS chip. The clamping switchincludes a clamping DMOS chip. For applications, the DMOS package may beincluded in a pair-switch flyback converter, a pair-switch active clampforward converter, or a pair-switch active clamp forward/flybackconverter.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows circuitry of a single-switch flyback converter.

FIG. 2 shows a conventional printed circuit board (PCB) layout for asingle-switch flyback converter.

FIG. 3 is a cross sectional view of a double-diffused metal-oxidesemiconductor (DMOS) package in examples of the present disclosure.

FIG. 4A is a cross sectional view of another DMOS package in examples ofthe present disclosure. FIG. 4B is a cross sectional view of yet anotherDMOS package in examples of the present disclosure.

FIG. 5 is a cross sectional view of still another DMOS package inexamples of the present disclosure.

FIG. 6 shows a PCB layout for a single-switch flyback converter inexamples of the present disclosure.

FIG. 7 is a top view of a pair-switch DMOS package having a main switchand a clamping switch in examples of the present disclosure.

FIG. 8 shows application circuitry of a pair-switch flyback converter inexamples of the present disclosure.

FIG. 9 shows application circuitry of a pair-switch active clamp forwardconverter in examples of the present disclosure.

FIG. 10 shows application circuitry of a pair-switch active clampforward/flyback converter in examples of the present disclosure.

DETAILED DESCRIPTION OF THE INVENTION

FIG. 3 is a cross sectional view of a double-diffused metal-oxidesemiconductor (DMOS) package 100 in examples of the present disclosure.The DMOS package 100 includes a lead frame 120, an insulation material130, a main DMOS chip 140, a first plurality of metal bumps 160, asecond plurality of metal bumps 170, a wire 180 and a moldingencapsulation 190. The lead frame 120 includes a gate section 122, asource section 124 and a drain section 126. To achieve thermalperformance and to reduce EMI noise, in one example, the source section124 accounts for more than 50% of the bottom surface area of the DMOSpackage 100. In another example, the source section 124 accounts formore than 70% of the bottom surface area of the DMOS package 100. Instill another example, the source section 124 is 10 times in size of thedrain section 126. The main DMOS chip 140 has a gate electrode 152 and asource electrode 154 disposed on a first surface 142 of the main DMOSchip 140 and a drain electrode 156 disposed on a second surface 144 ofthe main DMOS chip 140. The second surface 144 is opposite the firstsurface 142. The second surface 144 is parallel to the first surface142. The second surface 144 is at a location higher than the firstsurface 142.

The first plurality of metal bumps 160 are directly attached to the gateelectrode 152 of the main DMOS chip 140 and directly attached to thegate section 122 of the lead frame 120. The second plurality of metalbumps 170 are directly attached to the source electrode 154 of the mainDMOS chip 140 and directly attached to the source section 124 of thelead frame 120. The wire 180 connects the drain electrode 156 of themain DMOS chip 140 to the drain section 126 of the lead frame 120.

In examples of the present disclosure, the insulation material 130 isbetween a top surface of the lead frame 120 and the first surface 142 ofthe main DMOS chip 140. In examples of the present disclosure, theinsulation material 130 is directly attached to the first surface 142 ofthe main DMOS chip 140, the first plurality of metal bumps 160, thesecond plurality of metal bumps 170, the gate section 122 of the leadframe 120 and the source section 124 of the lead frame 120. In oneexample, the insulation material 130 is an electromagnetic shieldingmaterial. In another example, the insulation material 130 is polyimide.In still another example, the insulation material 130 is silicon gel.

The insulation material 130, the main DMOS chip 140, the first pluralityof metal bumps 160, the second plurality of metal bumps 170, the wire180 and a majority portion of the lead frame 120 are embedded in themolding encapsulation 190.

In examples of the present disclosure, the molding encapsulation 190 ismade of epoxy. In examples of the present disclosure, the lead frame ismade of metal. In examples of the present disclosure, the lead frame ismade of aluminum. To achieve thermal performance and to reduce EMInoise, in one example, the bottom surface area of the source section 124exposed outside the encapsulation 190 accounts for more than 50% of thebottom surface area of the DMOS package 100. In another example, thebottom surface area of the source section 124 exposed outside theencapsulation 190 accounts for more than 70% of the bottom surface areaof the DMOS package 100. In still another example, the bottom surfacearea of the source section 124 exposed outside the encapsulation 190 ismore than 10 times the bottom surface area of the drain section 126exposed outside the encapsulation 190.

FIG. 4A is a cross sectional view of a DMOS package 200 in examples ofthe present disclosure. The DMOS package 200 includes a lead frame 220,an insulation material 230, a main DMOS chip 240, a first plurality ofmetal bumps 260, a second plurality of metal bumps 270, a wire 280 and amolding encapsulation 290. The lead frame 220 includes a gate section222, a source section 224 and a drain section 226. The main DMOS chip240 has a gate electrode 252 and a source electrode 254 disposed on afirst surface 242 of the main DMOS chip 240 and a drain electrode 256disposed on a second surface 244 of the main DMOS chip 240. The secondsurface 244 is opposite the first surface 242. The second surface 244 isparallel to the first surface 242. The second surface 244 is at alocation higher than the first surface 242.

In examples of the present disclosure, a first V-shaped groove 232 isformed in the gate section 222 of the lead frame 220 near and parallelto a first edge 246 of the first surface 242 of the main DMOS chip 240.A second V-shaped groove 234 is formed in the source section 224 of thelead frame 220 near and parallel to a second edge 248 of the firstsurface 242 of the main DMOS chip 240. The first V-shaped groove 232 andthe second V-shaped groove 234 are filled with the molding encapsulation290.

The first plurality of metal bumps 260 are directly attached to the gateelectrode 252 of the main DMOS chip 240 and directly attached to thegate section 222 of the lead frame 220. The second plurality of metalbumps 270 are directly attached to the source electrode 254 of the mainDMOS chip 240 and directly attached to the source section 224 of thelead frame 220. The wire 280 connects the drain electrode 256 of themain DMOS chip 240 to the drain section 226 of the lead frame 220.

In examples of the present disclosure, the insulation material 230 isbetween a top surface of the lead frame 220 and the first surface 242 ofthe main DMOS chip 240. In examples of the present disclosure, theinsulation material 230 is directly attached to the first surface 242 ofthe main DMOS chip 240, the first plurality of metal bumps 260, thesecond plurality of metal bumps 270, the gate section 222 of the leadframe 220 and the source section 224 of the lead frame 220. In oneexample, the insulation material 230 is an electromagnetic shieldingmaterial.

The insulation material 230, the main DMOS chip 240, the first pluralityof metal bumps 260, the second plurality of metal bumps 270, the wire280 and a majority portion of the lead frame 220 are embedded in themolding encapsulation 290. To achieve thermal performance and to reduceEMI noise, in one example, the bottom surface area of the source section224 exposed outside the molding encapsulation 290 accounts for more than50% of the bottom surface area of the DMOS package 200. In anotherexample, the bottom surface area of the source section 224 exposedoutside the molding encapsulation 290 accounts for more than 70% of thebottom surface area of the DMOS package 200. In still another example,the bottom surface area of the source section 224 exposed outside themolding encapsulation 290 is more than 10 times the bottom surface areaof the drain section 226 exposed outside the molding encapsulation 290.

FIG. 4B is a cross sectional view of a DMOS package 201 in examples ofthe present disclosure. The DMOS package 201 includes a lead frame 220,an insulation material 230, a main DMOS chip 240, a first plurality ofmetal bumps 260, a second plurality of metal bumps 270, a clip 282 and amolding encapsulation 291. The lead frame 220 includes a gate section222, a source section 224 and a drain section 226. The main DMOS chip240 has a gate electrode 252 and a source electrode 254 disposed on afirst surface 242 of the main DMOS chip 240 and a drain electrode 256disposed on a second surface 244 of the main DMOS chip 240. The secondsurface 244 is opposite the first surface 242. The second surface 244 isparallel to the first surface 242. The second surface 244 is at alocation higher than the first surface 242. To achieve thermalperformance and to reduce EMI noise, in one example, the bottom surfacearea of the source section 224 exposed outside the molding encapsulation291 accounts for more than 50% of the bottom surface area of package201. In another example, the bottom surface area of the source section224 exposed outside the molding encapsulation 291 accounts for more than70% of the bottom surface area of package 201. In still another example,the bottom surface area of the source section 224 exposed outside themolding encapsulation 291 is more than 10 times the bottom surface areaof the drain section 226 exposed outside the molding encapsulation 291.

FIG. 5 is a cross sectional view of a double-diffused metal-oxidesemiconductor (DMOS) package 300 in examples of the present disclosure.The DMOS package 300 includes a lead frame 320, a main DMOS chip 340, afirst plurality of metal bumps 360, a second plurality of metal bumps370, a ribbon 384 and a molding encapsulation 390. The lead frame 320includes a gate section 322, a source section 324 and a drain section326. The main DMOS chip 340 has a gate electrode 352 and a sourceelectrode 354 disposed on a first surface 342 of the main DMOS chip 340and a drain electrode 356 disposed on a second surface 344 of the mainDMOS chip 340. The second surface 344 is opposite the first surface 342.The second surface 344 is parallel to the first surface 342. The secondsurface 344 is at a location higher than the first surface 342.

The first plurality of metal bumps 360 are directly attached to the gateelectrode 352 of the main DMOS chip 340 and directly attached to thegate section 322 of the lead frame 320. The second plurality of metalbumps 370 are directly attached to the source electrode 354 of the mainDMOS chip 340 and directly attached to the source section 324 of thelead frame 320. The ribbon 384 connects the drain electrode 356 of themain DMOS chip 340 to the drain section 326 of the lead frame 320.

In examples of the present disclosure, the gate section 322 of the leadframe 320 has a first raised portion 332. The source section 324 of thelead frame 320 has a second raised portion 334. The first plurality ofmetal bumps 360 are directly attached to the first raised portion 332.The second plurality of metal bumps 370 are directly attached to thesecond raised portion 334.

The main DMOS chip 340, the first plurality of metal bumps 360, thesecond plurality of metal bumps 370, the ribbon 384 and a majorityportion of the lead frame 320 are embedded in the molding encapsulation390. To achieve thermal performance and to reduce EMI noise, in oneexample, the bottom surface area of the source section 324 exposedoutside the molding encapsulation 390 accounts for more than 50% of thebottom surface area of the DMOS package 300. In another example, thebottom surface area of the source section 324 exposed outside themolding encapsulation 390 accounts for more than 70% of the bottomsurface area of the DMOS package 300. In still another example, thebottom surface area of the source section 324 exposed outside themolding encapsulation 390 is more than 10 times the bottom surface areaof the drain section 326 exposed outside the molding encapsulation 390.

FIG. 6 shows another PCB layout 600 for a single-switch flybackconverter in examples of the present disclosure. In examples of thepresent disclosure, The PCB layout 600 has a large copper pad area 620connected to ground through resistor R2 and a small copper pad area 610connected to a high voltage input through transformer TX. The PCB layout600 is configured to receive a main DMOS switch Q1 having a constructionas shown in FIG. 3, FIG. 4A, FIG. 4B or FIG. 5, with a source sectionattached to the large copper pad area 620 and the drain section attacheda small copper pad area 610. The main DMOS chip is above the largecopper pad area 620 with most of the bottom of source area 660 exposedoutside the encapsulation of the DMOS package overlapping the largecopper pad area 620. The source electrode of the main DMOS switch isconnected to ground through resistor R2. The drain electrode of the mainDMOS switch is connected to high input voltage through transformer TX1.In one example, the source area 660 is configured to connect to thesource section 124 of the lead frame 120 of FIG. 3. In another example,the source area 660 is configured to connect to the source section 224of the lead frame 220 of FIG. 4A. In still another example, the sourcearea 660 is configured to connect to the source section 324 of the leadframe 320 of FIG. 5. It provides more safety space for high voltage. Ithas better reliability. A smaller drain area requires less space forinsulation. Even with a large copper pad area 620 (for example, largerthan 10 mm in length and 5 mm in width), the EMI noise is smaller thanthat of FIG. 4.

FIG. 7 is a top view of a pair-switch DMOS package 700 having a mainswitch 702 and a clamping switch 704 in examples of the presentdisclosure. In one example, the main switch is a main DMOS chip same asthe main DMOS chip 140, 240 or 340 in the single switch DMOS packages100, 200, 201 or 300. The pair-switch DMOS package 700 is substantiallythe same package as 100, 200, 201 or 300 except that the lead frame ofthe pair-switch DMOS package 700 has in addition a clamping switchsection 736 and an optional clamping switch gate section 732. Theclamping switch is a clamping DMOS chip having its drain electrodedirectly attached to the clamping switch section 736, its gate electrodeelectrically connected to the clamping gate section 732 through aconductive member, and its source electrode electrically connected tothe drain section 726 to which the drain electrode of the main switch702 is also connected. Alternatively the source electrode of theclamping DMOS chip may be connected to the drain electrode of the mainDMOS chip through one or more conductive members (not shown). Theclamping DMOS chip has a chip size less than ⅕ of the chip size of themain DMOS chip. The main switch 702 and the clamping switch 704 areembedded in the molding encapsulation 790. To achieve thermalperformance and to reduce EMI noise, in one example, the bottom surfacearea of the source section 724 exposed outside the molding encapsulation790 accounts for more than 30% of the bottom surface area of thepair-switch DMOS package 700. In another example, the bottom surfacearea of the source section 724 exposed outside the molding encapsulation790 accounts for more than 50% of the bottom surface area of thepair-switch DMOS package 700. In still another example, the bottomsurface area of the source section 724 exposed outside the moldingencapsulation 790 is more than 10 times the bottom surface area of thedrain section 726 exposed outside the molding encapsulation 790.

In examples of the present disclosure, the clamping switch 704 is aclamping DMOS chip having a source electrode above a drain electrode.Therefore, a vertical distance between the source electrode of the chipof the clamping switch 704 and the lead frame (for example, the leadframe 120 of FIG. 3) is smaller than a vertical distance between thedrain electrode of the chip of the clamping switch 704 and the leadframe (for example, the lead frame 120 of FIG. 3). As an option, thepair-switch DMOS package 700 may also include a driver circuitintegrated with the clamping DMOS chip or as a separate chip copackedinside the packaged (not shown).

FIG. 8 shows application circuitry 800 of a pair-switch flybackconverter in examples of the present disclosure. The pair-switch flybackconverter includes a package 812 and a transformer 840. In examples ofthe present disclosure, the package 812 is the pair-switch DMOS packageof FIG. 7. The package 812 further includes a driver 832. Thetransformer 840 has a primary winding 842 and a secondary winding 844. Afirst end of the main switch 802 is connected to a first end of theprimary winding 842 of the transformer 840. A second end of the mainswitch 802 is connected to a ground. A control end of the main switch802 is connected to the driver 832. The main switch 802 is fordelivering energy to output. A clamping switch 804 is for deliveringreactive power. The clamping switch 804 helps the main switch 802 toachieve zero-voltage switch (ZVS). The pair-switch flyback converter ofFIG. 8 may be implemented on a PCB similar to the PCB layout 600 in FIG.6 having a large copper pad area 620 for connecting the main switchsource electrode and a small copper pad area 610 for connecting the mainswitch drain electrode.

FIG. 9 shows application circuitry 900 of a pair-switch active clampforward converter in examples of the present disclosure. The pair-switchactive clamp forward converter includes a package 912, the clampcapacitor 978, and a transformer 940. In examples of the presentdisclosure, the package 912 is the pair-switch DMOS package of FIG. 7.The package 912 further includes a driver 932. The transformer 940 has aprimary winding 942 and a secondary winding 944. A first end of the mainswitch 902 is connected to a first end of the primary winding 942 of thetransformer 940. A second end of the main switch 902 is connected to aground. A control end of the main switch 902 is connected to the driver932. A clamping clamp may be implemented using an N-channel DMOS. Theclamp capacitor 978 is in parallel to the primary winding 942 of thetransformer 940. The clamping switch 904 helps the main switch 902 toachieve zero-voltage switch (ZVS). The pair-switch active clamp forwardconverter of FIG. 9 may be implemented on a PCB similar to the PCBlayout 600 in FIG. 6 having a large copper pad area 620 for connectingthe main switch source electrode and a small copper pad area 610 forconnecting the main switch drain electrode.

FIG. 10 shows application circuitry 1000 of a pair-switch active clampforward-flyback converter in examples of the present disclosure. Thepair-switch active clamp forward-flyback converter includes a package1012, a clamp capacitor 1078, a control circuit 1094 and a transformer1040. In examples of the present disclosure, the package 1012 is thepair-switch DMOS package of FIG. 7. The package 1012 includes a mainswitch 1002 and a clamping switch 1004. The transformer 1040 has aprimary winding 1042 and a secondary winding 1044. A first end of themain switch 1002 is connected to a first end of the primary winding 1042of the transformer 1040. A control end of the main switch 1002 isconnected to the control circuit 1094. The clamp capacitor 1078 is inparallel to the primary winding 1042 of the transformer 1040. A firstend of the clamping switch 1004 is connected to a first end of the clampcapacitor 1078. The secondary winding 1044 is of a center-tappedconfiguration to integrate a forward sub-circuit and a flybacksub-circuit. The flyback sub-circuit under continuous conduction mode isemployed to directly transfer the reset energy of the transformer 1040to the output load. The forward sub-circuit under discontinuousconduction mode can correspondingly adjust the duty ratio with theoutput load change. Under the heavy load condition, the mechanism ofactive-clamp flyback sub-circuit can provide sufficient resonant currentto facilitate the parasitic capacitance of the switches to be dischargedto zero. Under the light load condition, the time interval in which theresonant current turns from negative into positive is prolonged toensure zero voltage switching function. The pair-switch active clampforward-flyback converter of FIG. 10 may be implemented on a PCB similarto the PCB layout 600 in FIG. 6 having a large copper pad area 620 forconnecting the main switch source electrode and a small copper pad area610 for connecting the main switch drain electrode.

Those of ordinary skill in the art may recognize that modifications ofthe embodiments disclosed herein are possible. For example, a number ofmetal bumps may vary. Other modifications may occur to those of ordinaryskill in this art, and all such modifications are deemed to fall withinthe purview of the present invention, as defined by the claims.

1. A double-diffused metal-oxide semiconductor (DMOS) packagecomprising: a lead frame comprising a gate section; a source section;and a drain section; a main DMOS chip having a gate electrode and asource electrode disposed on a first surface of the main DMOS chip and adrain electrode disposed on a second surface of the main DMOS chip; thesecond surface being opposite the first surface; a layer of insulationmaterial between the lead frame and the main DMOS chip; one or morefirst metal bumps directly attached to the gate electrode of the mainDMOS chip and directly attached to the gate section of the lead frame;one or more second metal bumps directly attached to the source electrodeof the main DMOS chip and directly attached to the source section of thelead frame; a connecting member connecting the drain electrode of themain DMOS chip to the drain section of the lead frame; and a moldingencapsulation; wherein the main DMOS chip, the one or more first metalbumps, the one or more second metal bumps, the connecting member and amajority portion of the lead frame are embedded in the moldingencapsulation; and wherein a bottom surface area of the source sectionexposed outside the molding encapsulation is more than fifty percent ofa bottom surface area of the DMOS package.
 2. The DMOS package of claim1, wherein the connecting member is a wire, a ribbon or a clip.
 3. TheDMOS package of claim 1, wherein the molding encapsulation is made of anepoxy and wherein the lead frame is made of a metal.
 4. The DMOS packageof claim 1, wherein the insulation material is directly attached to thefirst surface of the main DMOS chip, the one or more first metal bumps,the one or more second metal bumps, the gate section of the lead frameand the source section of the lead frame; and wherein the insulationmaterial is embedded in the molding encapsulation.
 5. The DMOS packageof claim 1, wherein the insulation material is made of anelectromagnetic shielding material.
 6. The DMOS package of claim 1,wherein a first V-shaped groove is formed in the gate section of thelead frame near and parallel to a first edge of the first surface of themain DMOS chip; wherein a second V-shaped groove is formed in the sourcesection of the lead frame near and parallel to a second edge of thefirst surface of the main DMOS chip; and wherein the first V-shapedgroove and the second V-shaped groove are filled with the moldingencapsulation.
 7. The DMOS package of claim 1, wherein the gate sectionof the lead frame has a first raised portion; wherein the source sectionof the lead frame has a second raised portion; wherein the one or morefirst metal bumps are directly attached to the first raised portion;and. wherein the one or more second metal bumps are directly attached tothe second raised portion.
 8. (canceled)
 9. The DMOS package of claim 1,wherein a bottom surface area of the source section exposed outside themolding encapsulation is more than seventy percent of a bottom surfacearea of the DMOS package.
 10. A double-diffused metal-oxidesemiconductor (DMOS) package comprising: a lead frame comprising a gatesection; a source section; and a drain section; a main DMOS chip havinga gate electrode and a source electrode disposed on a first surface ofthe main DMOS chip and a drain electrode disposed on a second surface ofthe main DMOS chip; the second surface being opposite the first surface;a layer of insulation material between the lead frame and the main DMOSchip; one or more first metal bumps directly attached to the gateelectrode of the main DMOS chip and directly attached to the gatesection of the lead frame; one or more second metal bumps directlyattached to the source electrode of the main DMOS chip and directlyattached to the source section of the lead frame; a connecting memberconnecting the drain electrode of the main DMOS chip to the drainsection of the lead frame; and a molding encapsulation; wherein the mainDMOS chip, the one or more first metal bumps, the one or more secondmetal bumps, the connecting member and a majority portion of the leadframe are embedded in the molding encapsulation; and wherein a bottomsurface area of the source section exposed outside the moldingencapsulation is more than ten times a bottom surface area of the drainsection exposed outside the molding encapsulation.
 11. The DMOS packageof claim 1 further comprising a clamping DMOS chip disposed on aclamping switch section of the lead frame.
 12. A double-diffusedmetal-oxide semiconductor (DMOS) package comprising: a lead framecomprising a gate section; a source section; and a drain section; a mainDMOS chip having a gate electrode and a source electrode disposed on afirst surface of the main DMOS chip and a drain electrode disposed on asecond surface of the main DMOS chip; the second surface being oppositethe first surface; a layer of insulation material between the lead frameand the main DMOS chip; one or more first metal bumps directly attachedto the gate electrode of the main DMOS chip and directly attached to thegate section of the lead frame; one or more second metal bumps directlyattached to the source electrode of the main DMOS chip and directlyattached to the source section of the lead frame; a connecting memberconnecting the drain electrode of the main DMOS chip to the drainsection of the lead frame; a molding encapsulation; and a clamping DMOSchip disposed on a clamping switch section of the lead frame; whereinthe main DMOS chip, the one or more first metal bumps, the one or moresecond metal bumps, the connecting member and a majority portion of thelead frame are embedded in the molding encapsulation; and wherein a chipsize of the clamping DMOS chip is less than twenty percent of a chipsize of the main DMOS chip.
 13. The DMOS package of claim 10, wherein abottom surface area of the source section exposed outside the moldingencapsulation is more than fifty percent of a bottom surface area of theDMOS package.
 14. The DMOS package of claim 12, wherein a bottom surfacearea of the source section exposed outside the molding encapsulation ismore than ten times a bottom surface area of the drain section exposedoutside the molding encapsulation.
 15. The DMOS package of claim 1further comprising a diver circuit and a clamping DMOS chip disposed ona clamping switch section of the lead frame.
 16. A high voltageconverter implemented on a printed circuit board (PCB) comprising: atransformer having a primary winding and a secondary winding; a DMOSpackage comprising a main switch having a source electrode connected toa source lead and a drain electrode connected to a drain lead; and aresistor having a first end and a second end; the second end of theresistor being connected to a ground; wherein the drain lead is attachedto a drain copper pad on the PCB so that the drain electrode of the mainswitch is connected to a first end of the primary winding of thetransformer; wherein the source lead is attached to a source copper padon the PCB so that the source electrode of the main switch is connectedto the first end of the resistor; and wherein an area of the source leadoverlapping the source copper pad on the PCB is substantially largerthan an area of the drain lead overlapping the drain copper pad on thePCB.
 17. The high voltage converter of claim 16, wherein a printedcircuit board (PCB) layout includes a rectangular source copper padarea; wherein a length of the rectangular source copper pad area islonger than ten millimeters; and wherein a width of the rectangularsource copper pad area is wider than five millimeters.
 18. The highvoltage converter of claim 16 wherein: the DMOS package having anexposed bottom area of the source lead at least ten times larger than anexposed bottom area of the drain lead.
 19. The high voltage converter ofclaim 16 wherein: the DMOS package having an exposed bottom area of thesource lead at least fifty percent of a bottom surface area of the DMOSpackage.
 20. The high voltage converter of claim 16 wherein: the DMOSpackage further comprising a clamping switch.
 21. The high voltageconverter of claim 20 wherein: the DMOS package further comprising adriver circuit.
 22. A double-diffused metal-oxide semiconductor (DMOS)package comprising: a lead frame comprising a gate section; a sourcesection; a drain section; and a clamping switch section; a main DMOSchip having a gate electrode and a source electrode disposed on a firstsurface of the main DMOS chip and a drain electrode disposed on a secondsurface of the main DMOS chip; the second surface of the main DMOS chipbeing opposite the first surface of the main DMOS chip; one or morefirst metal bumps directly attached to the gate electrode of the mainDMOS chip and directly attached to the gate section of the lead frame;one or more second metal bumps directly attached to the source electrodeof the main DMOS chip and directly attached to the source section of thelead frame; a connecting member connecting the drain electrode of themain DMOS chip to the drain section of the lead frame; and a clampingDMOS chip having a gate electrode and a source electrode disposed on afirst surface of the clamping DMOS chip and a drain electrode disposedon a second surface of the clamping DMOS chip; the second surface of theclamping DMOS chip being opposite the first surface of the clamping DMOSchip; wherein the source electrode of the clamping DMOS is electricallyconnected to the drain section and wherein a chip size of the clampingDMOS chip is less than twenty percent of a chip size of the main DMOSchip.
 23. The DMOS package of claim 22, wherein a bottom surface area ofthe source section exposed outside a molding encapsulation is more thanfifty percent of a bottom surface area of the DMOS package.
 24. The DMOSpackage of claim 22, wherein a bottom surface area of the source sectionexposed outside a molding encapsulation is more than ten times a bottomsurface area of the drain section exposed outside the moldingencapsulation.